WebMay 18, 2024 · Poly(4-hydroxystyrene) (PHS)-type, acryl-type, and hybrid-type photoresists were examined. The effect of the alkyl chain length of tetraalkylammonium cations depended on the type of photoresist. The dissolution dynamics depended on the combination of types of photoresist and developer. WebThe present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a …
Impact of HBr and Ar cure plasma treatments on 193nm photoresists
WebFeb 1, 2002 · The deprotection reaction front profile between exposed and unexposed regions of a chemically amplified photoresist can limit the ultimate feature resolution (i.e. image blur and CD control). Factors that affect the reaction front include the diffusion of the photogenerated acid, the catalytic length of the regenerated acid, composition of the ... WebThe invention also relates to a photoresist composition containing the resin compound. The photoresist composition can be used for solving the problemsof adhesive film cracking, poor side morphology, bottom gaps and the like in the KrF thick film photoresist application process, and the film thickness range can reach 8-20 [mu]m. darwell\u0027s cafe long beach
Practical route for the preparation of poly (4-hydroxystyrene), a ...
WebUnderstanding the dissolution behavior of photoresist materials is an important step in being able to control their lithographic performance. In this paper, we present a fundamental study of dissolution behavior of a new type of photoresist based on molecular glasses (MGs). This study focuses on MG resists derived from a phenolic functionality similar to … WebSep 30, 2024 · A photoresist underlayer composition, comprising a first material comprising two or more hydroxy groups; a second material comprising two or more glycidyl groups; an additive, wherein the additive comprises a compound of Formula (5), a compound of Formula (6), or a combination thereof; and a solvent, wherein the structures of Formula (5) … WebJul 19, 2002 · The current technology, chemically amplified photoresists, uses a complex reaction-diffusion process to delineate patterned areas with high spatial resolution. However, nanometer-level control of this critical process is limited by the lack of direct measurements of the reaction front. We demonstrate the use of x-ray and neutron … bitbbh read my book